2002 Review of the ARL-ARO Multidisciplinary University Research Initiative (MURI) on Deep Sub-Wavelength Optical Nanolithography

PROGRAM MANAGER: Dr. Dwight Woolard, US ARL-ARO,
(for further information email to woolardd@arl.aro.army.mil)

Click here to download MURI abstracts in PDF format

Click here to download MURI posters in PDF Format

On behalf of the Army Research Laboratory (ARL) and the Army Research Office (ARO), the 2002 Review of the ARL-ARO Multidisciplinary University Research Initiative (MURI) on Deep Sub-Wavelength Optical Nanolithography was held at the Center for High Technology Materials of the University of New Mexico in Albuquerque, New Mexico on September 25-26th, 2002.

This program is composed of teams of researchers from the University of New Mexico and the University of California at Los Angeles. The entire program is under the direction of Professor Steven Brueck, Director of the Center for High Technology Materials at the University of New Mexico, and Professor Eli Yablonovitch directs the contributions from the University of California at Los Angeles.

This MURI program includes a number of critical areas for the advancement of optical lithography including: precision staging, imaging interferometric lithography to reach linear systems limits of CDs ~ l/3, interferometric microscopy for mask inspection, nonlinear extensions of lithography beyond the linear systems limits, signal processing to optimize the exposure process with resolution enhancement techniques, and nanoscale metrology. We are optimistic that this program will impact the future development of integrated circuits, and confidant that it will enable a host of emerging applications in nanoscience and nanotechnology. Active areas of nanoscience research to which work in this MURI is contributing include: nano-hetero-epitaxy for the growth of lattice mismatched materials and integration with silicon; growth of quantum dots on nano-patterned wafers combining lithography and self assembly; nanofluidics for bio-separations and sensors; nanoscale field-emission for cathodes and displays; 2D photonic bandgap materials for optical coupling and lasers. The impact of the MURI programs on these areas was reviewed.

ARO/MURI REVIEW SCHEDULE
DEEP SUBWAVELENGTH OPTICAL NANOLITHOGRAPHY
September 25-26, 2002
Center for High Technology Materials, University of New Mexico, Albuquerque, NM
Wednesday, September 25

8:00 Registration and Continental Breakfast
8:30 Welcome and Logistics S. R. J. Brueck, UNM
8:40 ARO Comments D. Woolard, ARO
9:00 Program Overview S. R. J. Brueck, UNM
9:30 Stage Development for Nanoscale Lithography H. Tran, UNM
10:30 BREAK
11:00 Imaging Interferometric Lithography and Microscopy S. R. J. Brueck, UNM
12:00 LUNCH
1:30 Solving the Inverse Phase Mask Problem, Including Realistic Mask Electromagnetics E. Yablonovitch, UCLA
2:30 Nanoscale Metrology P. Logofatu, UNM
3:15 BREAK and Poster Session

6:00 Informal Dinner

Thursday, September 26

8:00 Registration and Continental Breakfast
8:30 Signal Processing for Lithography B. Santanam, UNM
9:30 Nanoscience applications S. R. J. Brueck, UNM
10:30 BREAK
11:00 Summary and Discussion All PIs
11:30 LUNCH
1:00 EAB and TAC Meeting D. Woolard, ARO
2:00 EAB Meeting D. Woolard, ARO
3:00 Feedback to PIs D. Woolard, ARO