Center for High Technology Materials 1313 Goddard SE Rm. 145 Albuquerque NM 87106, USA Tel: 505 272 7800  Fax: 505 272 7801 E-mail Professional Employment History University of New Mexico Distinguished Professor of Electrical and Computer Engineering 2006-present University of New Mexico Director, Center for High Technology Materials 1986-present University of New Mexico Professor of Electrical and Computer Engineering, Professor of Physics and Astronomy 1985-present MIT Lincoln Laboratory Research Staff Member, Quantum Electronics Group 1973-1985 MIT Lincoln Laboratory Postdoctoral Appointment, Quantum Electronics Group 1971-1973 MIT Lincoln Laboratory Research Assistant, Applied Physics Group 1967-1971 Bell Telephone Laboratories Member Technical Staff Summer 1967 MIT Research Assistant, Research Laboratory of Electronics 1965-1967 Boards of Directors:   LightPath Technologies, Inc. (public company; manufacturer of passive optical components) Science and Technology Corporation @ UNM (University tech transfer organization) 2000-present 2001-2005 Scientific Advisory Boards:   Micro-Optical Devices (MODE) LightPath Technologies, Inc. (Chair) Center for Integrated Nanotechnologies (Sandia/Los Alamos National Laboratories) 1994 2002-present 2002-present Education   Doctor of Philosophy in Electrical Engineering Massachusetts Institute of Technolgy Thesis: Spontaneous and Stimulated Spin-Flip Raman Scattering in InSb 1971 Master of Science in Electrical Engineering Massachusetts Institute of Technology Thesis: Microwave Acoustic Instabilities in Semiconductors in a Magnetic Field 1967 Bachelor of Science in Electrical Engineering Columbia University 1965 Research Experience First demonstration of CW stimulated Raman scattering (spin-flip scattering in InSb) Physics of spontaneous and stimulated spin-flip Raman scattering Vibrational energy transfer in cryogenic liquids Discovery of radiatively limited lifetime of 1-sec for vibrational mode of liquid N2; 1012 x the vibrational dephasing time Nonlinear optics of cryogenic liquids (third harmonic generation, two-photon linewidths, Kerr switching) Importance of vibration-rotation coupling in determining the two-photon Q-branch (Raman) lineshape in liquids Raman scattering studies of stress in silicon-on-insulator materials Development of surface-acoustic wave spectroscopy as an ultrasensitive technique for the measurement of submonolayer absorbate coverages Record sensitivity for absorbance measurements of aL~ 10-9 Reactive-ion etch induced fluorescence for the depth profiling of impurities (e.g. Na) in SiO2 Laser-induced fluorescence studies of radical species in plasma-etching of semiconductor materials Stimulated surface-plasma wave scattering leading to surface ripples in laser-material interactions Enhanced coupling of light to nanostructures on the scale of the optical wavelength Resonant-periodic-gain surface-emitting lasers High-speed metal-semiconductor-metal (Ni-Si-Ni) photodetectors Ultra-high resolution MSM position sensors (< 4-nm precison) Discovery of large c(2) nonlinearity (~1-pm/V) in silica glass Electro-optic effect in bulk, thin film and fiber geometries Multiple-exposure interferometric lithography for extreme sub-micrometer lithography Fabrication technology for large area Si quantum walls and wires; studies of optical properties - Raman scattering and photoluminescence. Moiré and speckle techniques for noncontact temperature measurement with 1°C resolution. Sub-feature speckle interferometry, a new technique for non-contact, sub-l position measurement. Imaging interferometric lithography marrying optical and interferometric approaches to print arbitrary structures to ~70-nm scales. Imaging interferometric lithography – extending optical lithography to fundamental linear systems limits. Nonlinear interferometric lithography – use of processing nonlinearities to exceed the linear systems limits of optics. Nanoheteroepitaxy - growth of heterostructure materials (incl. GaAs and GaN on Si) using nanoscale seeds Calculation of dipole radiation in confined structures Nanofluidics - ionic fluid transport in nanoscale structures for biological separations Fabrication of integrated fluidic systems with hierarchical structure extending from 1-mm to 5-nm scales First mid-IR negative permeability material (analog of a split-ring resonator) First demonstration of a NIR negative index material Enhanced infrared detectors using plasmonic antennas to concentrate incident light to subwavelength scales First demonstration of second-harmonic generation in a plasmonic structure using a dipole-allowed nonlinear material (GaAs) Current Research (Oct-06) Imaging Interferometric lithography and nanoscience/nanotechnology are increasing in importance to both Si integrated circuit manufacturing and display research communities. We have worked with the dis-play industry to develop techniques for sparse structures (large line:space ratio) and single exposure two-dimensional patterning at the sub-micrometer level. SEMATECH (the consortium of the US silicon manufacturing industry) has developed the "miracle tool" for developing interferometric lithography for the 0.18-mm generation (initial volume manufacturing in 2001). Over the longer term, we are exploring the application of interferometry to the high-resolution that will be necessary for future generations of integrated circuits, by developing techniques to introduce the necessary pattern flexibility. We have demonstrated imaging-interferometric lithography with the potential to extend the resolution of optics to l/3 (45-nm at a 193-nm exposure wavelength). We are also exploring immersion lithography as ~ two­generation extension of the cababilities of optical lithography. Most recently, we have achieved a 23-nm half-pitch structure using immersion lithography along with a self-aligned frequency doubling process. This is a current world-record for the densest structures produced with 193-nm lithography and provide a demonstration that will impact the future of optical lithography. Other, fundamental-research-oriented applications of interferometric lithography include: studies of optical emission from Si nanostructures (< 10-nm feature sizes); nanoepitaxy - the use of interferometrically defined nanostructures as a substrate for epitaxial growth that may alleviate some of the limitations imposed on growth of heterostructure materials by differing lattice constants and thermal expansion coefficients; studies of linear and nonlinear electromagnetic interactions with materials structured at the wavelength scale (plasmonics and metamaterials); and nanofluidic devices for biological and catalytic application. Another important direction is the combination of top-down patterning and bottom-up self assembly to fabricate useful structures that go beyond the capabilities of lithographic patterning. Nanophotonics including plasmonics, metamaterials and photonic crystals is of increasing importance for extending our control of optical interactions. This is a natural application of interferometric lithography requiring large areas of periodic (or nearly periodic) structures. We have applied IL to plasmonics (enhanced transmission through nanoscale apertures - holes and coaxial structures; nonlinear optics - second harmonic generation), metamaterials (first negative permeability material in the IR, four orders of magnitude higher in frequency than previous results), and negative index materials (first demonstration of a NIR negative index material combining the negative permeability structures with a nonresonant (metal) negative permittivity. Nanofluidics is another important application area for interferometric lithography. The importance of nanofluidics stems from scaling both on the order of the Debye screening length for biological samples, fundamentally changing the electrokinetics, and on the order of biomolecular length scales forcing conformational changes (eg, stretching of DNA into a linear chain). Tunable Semiconductor Lasers remain a very active research area. There has been a long-standing need for tunable infrared lasers for molecular spectroscopy applications. We have recently demonstrated a world-record 350-mW single longitudinal mode output from a distributed feedback type-II laser at 3.7-micrometers; demonstration of continuous tenability is underway. Administrative Experience Technical leadership and administrative responsibilities have been major aspects of my position as director of the Center for High Technology Materials. CHTM was initiated by the state of New Mexico with goals of establishing a major research center, encouraging interactions with federal laboratories and industry, and contributing to the economic development of New Mexico. During my tenure at CHTM, it has grown to an internationally recognized center for nanoscience, optoelectronics and microelectronics research. Theses Supervised M Y A Raja Wavelength-Resonant Surface Emitting Semiconductor Laser PhD Physics 1988 Saleem H Zaidi An Investigation of Holographic Grating Fabrication and Optical Coupling to Surface Plasma Waves PhD Physics 1989 Schubert Soares High-Speed Ultraviolet Photomixers PhD EE 1989 Billy Wayne Mullins Heterodyne Characterization of High-Speed Photomixers for the Ultraviolet PhD Physics 1989 Yue-Chue Fong Confocal Photoluminescence - Theory and Applications PhD EE 1993 Ashwani Sharma Extended-Wavelength Si MSM Photodetectors MS EE 1994 David Burckel Sub-Feature Speckle Interferometry MS EE 1995 Congzhong Huang Noncontact, Optical Diffraction Measurement of Semiconductor Temperature MS EE 1995 Richard A Myers Large Second-Order Nonlinearity in Amorphous SiO2  Using Temperature/Electric-Field Poling PhD Physics 1995 An-Shyang Chu Si Quantum Walls: Fabrication and Optical Characterization PhD Physics 1996 John V Sandusky Microcavity Effects in an External Cavity Surface-Emitting Laser PhD Physics 1997 Kristen A M Scott Silicon Metal-Semiconductor-Metal Photodetectors: Ion-Implanted High-Speed Near-Infrared Photodiodes and Position-Sensitive Photodetectors PhD Physics 1997 Xiancun Tony Long Physics and Device Applications of Linear Electrooptic Effect in Poled Amorphous Silica-Based Materials PhD Physics 1998 Xiaolan Chen A Study of Interferometric Lithography – Approaching the Linear Systems Limit of Optics PhD EECE 1998 Thomas G Alley The Formation of the Second-Order Nonlinearity in Poled Fused Silica PhD Physics 1998 Jonathan Stohs Epitaxial Structure Dependence of Gain, Refractive Index, and Linewidth Enhancement Factor in GaAs and InGaAs Broad-Area Quantum Well Lasers PhD Physics 2000 Yanmin Wu Labview Programming for Lithographic Applications MS ECE 2001 Michael J O'Brien II Advances in Optics-Based Chemical and Biosensors with Array Applications PhD Opt Sci Physics 2002 Tengiz Svimonishvili Dual Closed-Loop Optoelectronic Auto-Oscillatory Detection Circuit for Monitoring Fluoresence­Lifetime­Based Chemical/Biological Sensors and Sensor Arrays MS ECE 2002 Seung Chang Lee Nanoscale Exitaxial Growth by Molecular Beam Epitaxy and Its Applications PhD ECE 2002 Alex Raub Deep-UV Immersion Interferometric Lithography MS ECE 2002 Babar Minhas Modeling of Two-Dimensional Resonant Structures PhD ECE 2002 Christian Schwarz Imaging Interferometric Lithography and Microscopy PhD Physics 2003 Ashwani Sharma Effects of Dimensional Nanoscaling on the Optical and Electronic Properties of Silicon Films-Walls-Wires PhD ECE 2004 David Burckel Photonic Crystal Slab Waveguides in Moderate Index Contrast Media: Generalized Transverse Bragg Waveguides PhD ECE 2004 Wenjun Fan Linear and Nonlinear Infrared Optical Properties of Subwavelength Coaxial Metallic Arrays PhD ECE 2005 Shuang Zhang Infrared Magnetic and Negative-Index Metamaterials PhD ECE 2005 Ying Luo Second Order Nonlinearities of Pb-Glass Waveguides PhD ECE 2005 Deying Xia Directed Self-Assembly of Silica Nanoparticles - 2-D Patterns and 3-D Structures with Applications to Nanofluidics PhD ECE 2005 Current Graduate Students Yulia Kuznetsova Physics PhD Dong Li ECE PhD Alexander Neumann Physics PhD Svjaloslav Smolev ECE PhD Alex Raub ECE PhD Khayhun Ku ECE PhD Jinglu Zhang ECE PhD Grants and Contracts Principal investigator on numerous grants and contracts with federal agencies while at MIT Lincoln Laboratory. Principal investigator of over $90 million in grants and contracts from both government and industry during tenure as director of CHTM. Professional Society Affiliations American Association for the Advancement of Science (Fellow) American Physical Society Institute of Electrical and Electronics Engineers (Fellow) Materials Research Society Optical Society of America (Fellow) Professional Activities Conference Organizing and Program Committees EIPBN'08 Conference Chairman PhAST'06 Photonics in Nanotechnology Symposium Chair EIPBN'06 Steering Committee EIPBN'05 Program Committee, Optical Lithography Section PhAST'05 Photonics in Nanotechnology Symposium Chair EIPBN'04 Program Committee, Optical Lithography Section PhAST'04 Photonics in Nanotechnology Symposium Chair PhAST'04 Founding General Co-Chair DoD Nanomaterials'04 Co-Chair, Electronic Materials CLEO'03 Chair, Long Range Planning Committee EIPBN'02 Program Committee, Optical Lithography Section BGPP'01 Program Committee EIPBN'01 Program Committee CLEO'00-01 Chair, Steering Committee CLEO'00 General Co-Chair BPPG’99 Program Committee Member - Nonlinear Optical Processes ICOSN’99 Co-chair, Joint Opt. Soc. Japan/SPIE Meeting CLEO’99 LEAP Co-Chair Doped Fiber Devices II Program committee member, part of Photonics East’98 CLEO’98 Program Committee Co-Chair SPIE’Photonics East Doped Fiber Devices II CLEO Pacific Rim’97 Program Committee in Nonlinear Optics APS March Mtg’97 Physics of Fiber Optics SPIE’96 Doped Fiber Devices CLEO Pacific Rim’95 Program Committee in Nonlinear Optics Electrochem Soc International Symposium on Advanced Luminescent Materials (1995) OSA Topical Mtg: Photosensitivity and Quadratic Nonlinearity in Glass Waveguides: Fundamentals and Applications (1995) MRS Rapid Thermal and Integrated Processing IV (1995) MRS Rapid Thermal and Integrated Processing III (1994) LEOS New Semiconductor Lasers and Applications (1990) CLEO'90 Optical Materials and Fabrication (chair) IEEE/OSA Nonlinear Optics (1990) SRC Metrology for Semiconductor Manufacturing (chair) CLEO'89 Nonlinear Optics and Spectroscopy LEOS'88 Optoelectronics CLEO'88 Nonlinear Optics and Spectroscopy CLEO'87 Nonlinear Optics and Spectroscopy (chair) Southwest Conference on Optics'87 Program Coordinator OSA/LEOS Laser Diagnostics of Materials 1987(program chair) IQEC'86 Semiconductor Nonlinear Optics MRS Laser Diagnostics and Processing for Semiconductor Device Materials (1982) CLEO'82 Nonlinear Optics and Spectroscopy Intl Conf on Lasers and Applications (Rio Brazil) Coordinator, 1982 Editorial   IEEE Journal of Special Topics in Quantum Electronics Founding Editor 1995 IEEE Journal of Quantum Electronics Editor Associate Editor 1989-1994 1986-1988 Optics Letters Associate Editor 1984-1986 National Research Council   Committee on Nanophotonics and Technology Futures 2006-present Standing Committee on Avoiding Technological Surprise (DIA) 2004-present Committee on the Implications of Micro and Nano Technology for the Air Force (chair) 2001-2002 Committee to Provide an Assessment of Science and Technology for the Army After Next with an Emphasis on Logistics (AAN-LOG) 1997-1999 Research Assistantship Committee 1989-1995 Member, Committee on Recom for US Army Basic Sci Res 1980-1985 Other   IEEE/LEOS Member, Engineering Award Committee Chair, Streifer Scientific Award Committee Member, Quantum Electronics Award Committee Member, Fellow Award Committee Elected member of Board of Governors Publications Committee Chair 1997 1995 1993-1994 1993 1989-1991 1988 OSA Member, Quantum Electronics Award Committee Member, Adolph Lomb Award Committee Member, Nick Holnyak Jr Award Committee Chair, Nick Holnyak Jr Award Committee 2005 2000 1998 1997 Office of the Secretary of Defense Advanced Research in Environmental Sensing II (ARES-II) participant 2001 Air Force Research Lab Senior Advisory Group to the Space Capability Protection Study 2001-2002 Army Research Office Electronics Program Strategic Planning Meeting Member, Electronics Program Board of Visitors 1999 University Review Panels Montana State University Ghulam Issaq Khan Institute, Topi, Pakistan, International Advisory Board University of Norrth Carolina at Charlotte, Physics Department Review 2003 1999 1996 Materials Research Society Finance Committee Member 1983-1985 American Physical Society: Executive Committee, New England Section 1982-1984 Awards Outstanding Researcher, College of Engineering, University of New Mexico 1991 Fellow of the Institute of Electrical and Electronics Engineers   Fellow of the Optical Society of America   Fellow of the American Association for the Advancement of Science   IEEE Third Millenium Medal   | HOME | RESUME | PUBLICATIONS | STUDENTS | | RESEARCH | EMPLOYMENT OPPORTUNITIES | LINKS | HOBBIES|