IMAGING INTERFEROMETRIC LITHOGRAPHY - EXTENDING OPTICS TO FUNDAMENTAL LIMITS

Problem:

• Traditional optical lithography is approaching hard limits set by optics and diffraction.

• Alternative lithographic technologies are not yet mature.

Approach:

• Use multiple exposures offset in frequency space to piece together a complete pattern.

• A WDM approach to lithography.

Results:

• Demonstrated ultimate resolution of optics (l/4) by interferometry. Results to 90 nm CD @ i-line.

• Demonstrated arbitrary patterns at low resolution to prove concept (improved resolution by ~3X over conventional imaging.)

Conventional Imaging

Imaging Interferometry

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